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The Influence of Shielding on the Biological Effectiveness of Accelerated Particles for the Induction of Chromosome Damage

机译:屏蔽对加速颗粒诱导染色体损伤的生物有效性的影响

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摘要

Chromosome damage was assessed in human peripheral blood lymphocytes after in vitro exposure to the either Si-28 (490 or 600 MeV/n), Ti-48 (1000 MeV/n), or Fe-56 (600, 1000, or 5000 MeV/n). LET values for these ions ranged from 51 to 184 keV/micron and doses ranged from 10 to 200 cGy. The effect of either aluminum or polyethylene shielding on the induction of chromosome aberrations was investigated for each ion. Chromosome exchanges were measured using fluorescence in situ hybridization (FISH) with whole chromosome probes in cells collected at G2 and mitosis in first division post irradiation after chromosomes were prematurely condensed using calyculin-A. The yield of chromosomal aberrations increased linearly with dose and the relative biological effectiveness (RBE) for the primary beams, estimated from the initial slope of the dose response curve for total chromosomal exchanges with respect to gamma-rays, ranged from 9 to 35. The RBE values increased with LET, reaching a maximum for the 600 MeV/n Fe ions with LET of 184 keV/micron. When the LET of the primary beam was below approximately 100 keV/micron, the addition of shielding material increased the effectiveness per unit dose. Whereas shielding decreased the effectiveness per unit dose when the LET of primary beams was higher than 100 keV/micron. The yield of aberrations correlated with the dose-average LET of the beam after traversal through the shielding.
机译:在体外暴露于Si-28(490或600 MeV / n),Ti-48(1000 MeV / n)或Fe-56(600、1000或5000 MeV)的体外暴露后,评估人外周血淋巴细胞的染色体损伤/ n)。这些离子的LET值范围为51至184 keV /微米,剂量范围为10至200 cGy。对于每种离子,研究了铝或聚乙烯屏蔽对染色体畸变诱导的影响。使用荧光原位杂交(FISH)和全染色体探针在G2收集的细胞中测量染色体交换,并在使用calyculin-A进行染色体过早浓缩后照射后的第一个分裂中进行有丝分裂。染色体像差的产生率随剂量线性增加,并且从总辐射相对于γ射线的剂量响应曲线的初始斜率估计,一次光束的相对生物有效性(RBE)为9至35。 RBE值随LET的增加而增加,当LET为184 keV /微米时,600 MeV / n Fe离子达到最大值。当主光束的LET低于约100 keV /微米时,添加屏蔽材料可提高单位剂量的效力。而当初级光束的LET高于100 keV /微米时,屏蔽会降低单位剂量的效力。像差的产生与穿过屏蔽后的光束的剂量平均LET相关。

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